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显影机设备/Developer

显影机设备/Developer

晶洲装备先后完成了从G2.5到G8.6及以上尺寸CF、Array、TP等工艺湿制程显影机设备的自主研发

适用工艺:CF、Array、TP

适用基板尺寸:All Size

适用基板厚度:≥0.3mm

刻蚀类型:Oscilation Type Shower 

设备类型:I Type,U Type,Line Type,Custom Made

工艺能力:

1.High Uniformity Ultra-low Pressure Spray;

2.Excellent Process Reliability,High CD Uniformity;

3.Defoaming Management;

4.No Mist, No Roller Mark, No Contamination And No Scratch;

5.Low Running Cost。


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G8.5 显影机设备/Developer
G8.5 显影机设备/Developer
4749铁l算盘资料大全
4749铁l算盘资料大全
4749铁l算盘资料大全